Mems device, manufacturing method thereof, and electronic apparatus

A method of manufacturing a MEMS device, comprising:

• providing a dielectric substrate;
• forming a driving electrode, a first reference electrode and a second reference electrode on the dielectric substrate;
• wherein the first reference electrode and the second reference electrode are on two sides of the driving electrode in an extending direction of the driving electrode, respectively;
• forming a first dielectric layer on a side of the driving electrode, the first reference electrode and the second reference electrode, away from the dielectric substrate;
• and
• forming a membrane bridge on a side of the first dielectric layer away from the dielectric substrate, wherein two ends of an orthographic projection of the membrane bridge on the dielectric substrate overlap orthographic projections of the first reference electrode and the second reference electrode on the dielectric substrate, respectively;
• and the driving electrode is in a space enclosed by the membrane bridge and the dielectric substrate,
• wherein a first gap is between the first reference electrode and the driving electrode;
• a second gap is between the second reference electrode and the driving electrode;
• and a thickness of a part of the first dielectric layer at each of the first gap and the second gap is greater than a thickness of the driving electrode;
• and/or
• the method further comprises forming a second dielectric layer on a side of a bridge deck of the membrane bridge close to the dielectric substrate, wherein an orthographic projection of the second dielectric layer on the dielectric substrate covers at least an orthographic projection of the driving electrode on the dielectric substrate.