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US 2025/0018532 A1Published application
Substrate holding device, substrate processing apparatus, substrate processing method, and storage medium
AssigneeEbara Corporation
InventorKeisuke NAMIKI
Life of this patent
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Abstract
A substrate holding device capable of eliminating a variation in a film thickness of a substrate is disclosed. The substrate holding device includes an offset mechanism configured to offset a carrier with respect to a retaining ring.
Claims19
A substrate holding device, comprising:
- an elastic membrane configured to form at least one pressure chamber for pressing a substrate;
- a carrier coupled to the elastic membrane;
- a retaining ring surrounding the carrier;
- and
- an offset mechanism configured to offset the carrier relative to the retaining ring.
2 more elements
A substrate processing method, comprising:
- pressing a substrate held by a substrate holding device against a polishing surface of a polishing pad to polish the substrate;
- determining an eccentricity direction and an eccentricity of a carrier coupled to an elastic membrane forming at least one pressure chamber for pressing the substrate based on a film thickness distribution of the substrate measured during polishing of the substrate;
- and
- operating an offset mechanism configured to offset the carrier based on the determined eccentricity direction and eccentricity to offset the carrier.
1 more element
A non-transitory computer-readable storage medium storing a program for causing a computer to perform the steps of:
- causing a substrate holding device to perform an operation of pressing a substrate against a polishing surface of a polishing pad to polish the substrate;
- determining an eccentricity direction and an eccentricity of a carrier coupled to an elastic membrane configured to form at least one pressure chamber for pressing the substrate based on a film thickness distribution of the substrate measured during polishing of the substrate;
- and
- causing an offset mechanism to perform an operation of offsetting the carrier based on the determined eccentricity direction and eccentricity.
1 more element
Dependencies are inferred from the claim text.