All-in-one wafer cleaning machine for monocrystalline silicon production

An all-in-one wafer cleaning machine for monocrystalline silicon production, comprising:

• a cleaning equipment main body;
• a drying chamber disposed at one side inside the cleaning equipment main body;
• a plurality of cleaning tanks disposed at the other side inside the cleaning equipment main body;
• a circulation track disposed at a rear end of the cleaning equipment main body and fixed to the cleaning equipment main body;
• a horizontal moving device disposed at an outer side of the circulation track;
• a first motor fixedly installed at one end inside the horizontal moving device;
• a first transmission gear disposed at an output end of the first motor;
• a first fixed rod fixedly disposed at the other end of the horizontal moving device;
• a first fixed gear disposed at one end of the first fixed rod, wherein the first transmission gear and the first fixed gear are engaged with the circulating track;
• and
• a vertical track fixedly disposed at the horizontal moving device.