Method and wet bench for the in-line processing of solar-cell substrates

Abstract

A method and a wet bench for processing a plurality of solar cell substrates are described. Each solar cell substrate includes a silicon wafer. The method includes steps of removing at least a partial area of a near-surface layer of the silicon wafer by an etching process by treating the surface of the solar cell substrate with an etching liquid, and producing a silicon oxide thin film at least on a partial surface of the solar cell substrate by treating the partial surface with an oxidising liquid. The solar cell substrates are subjected to process steps (i) and (ii) sequentially, one after the other within a single processing apparatus. The wet bench usable for etching liquid baths as well as oxidation liquid baths in which the solar cell substrates may be superficially oxidised, for example in an ozone-containing solution.

Dependencies are inferred from the claim text.