Method of fabricating a device having a passivating layer
AssigneeMicrosoft Technology Licensing, LLC
InventorsAsbjørn Cennet Cliff Drachmann, Charles Masamed Marcus
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Abstract
In one example of the disclosed technology, a method of fabricating a device comprises forming a patterned layer of a material on a surface of a substrate by depositing the material through a stencil mask, and forming a passivating layer over the patterned layer and the substrate surface in a sealed apparatus, the substrate being maintained under a vacuum until after the passivating layer has been formed. In some examples, the passivation is performed by oxidising a deposited aluminium layer within a deposition chamber. In some examples, the method can be used for fabricating hybrid semiconductor-superconductor devices, such as Majorana zero mode (MZM) nanowire structures for topological quantum bits.
Claims20
A method of fabricating a device, which method comprises:
- forming a patterned layer of a material on a surface of a substrate by depositing the material onto the surface through a stencil mask;
- and
- forming a passivating layer over the patterned layer and the surface;
- wherein the method is performed in a sealed apparatus, and the substrate is maintained under a vacuum until after the passivating layer has been formed.
A device fabricated according to a method, the method comprising:
- under a vacuum, forming a patterned layer of a material on a surface of a substrate for the device by depositing the material onto the surface through a stencil mask;
- and
- under a vacuum, forming a passivating layer over the patterned layer and the surface, comprising forming a layer of aluminum over the patterned layer and the surface and oxidising the layer of aluminium to form the passivating layer.
Dependencies are inferred from the claim text.