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US 2024/0425979 A1Published application
Yttrium-based protective film, method for producing same, and member
AssigneesAGC Inc., Tsubasa Science Corporation
InventorsMichio ISHIKAWA, Michio TANIMURA, Shuhei OGAWA, Tomonori OGAWA
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Abstract
The present invention relates to an yttrium-based protective film having: a peak intensity ratio of Y5O4F7 in an X-ray diffraction pattern of 80% or more; a porosity of less than 1.5 volume %; and a Vickers hardness of 500 MPa or more. The yttrium-based protective film may have a content of fluorine of 35 atom % to 60 atom %.
Claims14
An yttrium-based protective film having:
- a peak intensity ratio of Y5O4F7 in an X-ray diffraction pattern of 80% or more;
- a porosity of less than 1.5 volume %;
- and
- a Vickers hardness of 500 MPa or more.
1 more element
Dependencies are inferred from the claim text.