Apparatus and method for producing doped diamond layers
AssigneesCarboncompetence GmbH, Yg-1 Co., Ltd.
InventorsDetlef STEINMULLER, Doris STEINMULLER-NETHL, Maximilian STEINMULLER
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Abstract
The invention relates to a device (1) and a process for applying a doped diamond layer to a substrate (2, 2a) by chemical vapour deposition. The device (1) has a deposition chamber for holding the substrate (2, 2a), a gas activation element (7) in the form of a hollow body with a flow channel (7b) for a process gas, in particular hydrogen, an outlet opening (16) leading from the flow channel (7b) into the deposition chamber (3), a heating device (8) for heating a wall (7a) of the gas activation element (7) surrounding the flow channel (7b) and a solid precursor, other than carbon, within the flow channel (7b).
Claims20
A device for applying a doped diamond layer to a substrate by chemical vapour deposition, comprising:
- a deposition chamber for receiving the substrate,
- a gas activation element in the form of a hollow body with a flow channel for a process gas,
- an outlet opening leading from the flow channel into the deposition chamber,
- a heating device for heating a wall of the gas activation element, said wall surrounding the flow channel, and
- a solid, precursor other than carbon within the flow channel.
A process for applying a doped diamond layer to a substrate by chemical vapour deposition comprising the steps of:
- (a) providing the substrate and a gas activation element in the form of a hollow body with a flow channel in a deposition chamber,
- (b) providing a precursor other than carbon in the solid state inside the flow channel,
- (c) heating a wall of the gas activation element with a heating device, said wall surrounding the flow channel.
- (d) introducing a process gas, into the flow channel of the gas activation element,
- (e) activation of the process gas by impact excitation and thermal excitation, and activation of the precursor by thermal excitation,
- (f) introducing the activated process gas and the activated precursor through an outlet opening of the gas activation element into the deposition chamber, and
- (g) deposition of a doped diamond layer on the substrate.
Dependencies are inferred from the claim text.