Back to results
US 2024/0425366 A1Published application
Micro-electromechanical system and method for fabricating mems having protection wall
AssigneeUnited Microelectronics Corp.
InventorsJung-Hao CHANG, Weng-Yi Chen
Life of this patent
Estimating the term…
Abstract
A micro electromechanical system (MEMS) includes a substrate and a rear surface opposite to the surface, a semiconductor device and a protection wall. The substrate has a surface. The semiconductor device is disposed on the surface. The protection wall surrounds the semiconductor device and passes through the surface but not electrically contacts to the semiconductor device; wherein there is no electronic element disposed between the surface and the rear surface.
Claims10
A micro electromechanical system (MEMS), comprising:
- a substrate, having a surface and a rear surface opposite to the surface;
- a semiconductor device, disposed on the surface;
- and
- a protection wall, surrounding the semiconductor device and passing through to the surface but not electrically contacting to the semiconductor device;
- wherein there is no electronic element disposed between the surface and the rear surface.
2 more elements
A method for fabricating a MEMS, comprising:
- providing a substrate, having a surface and a rear surface opposite to the surface;
- forming a semiconductor device on the surface;
- forming a protection wall to make the protection wall surrounding the semiconductor device and passing through the surface but not electrically contacting to the semiconductor device;
- wherein there is no electronic element disposed between the surface and the rear surface.
1 more element
Dependencies are inferred from the claim text.