Fe-Pt-C-BASED SPUTTERING TARGET MEMBER, SPUTTERING TARGET ASSEMBLY, METHOD FOR FORMING FILM, AND METHOD FOR PRODUCING SPUTTERING TARGET MEMBER
AssigneeJX Metals Corporation
InventorsTakashi Kosho, Yusuke Horie
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Abstract
A Fe—Pt—C based sputtering target member that can suppress the generation of particles during sputtering is provided. A Fe—Pt—C based sputtering target member has a magnetic phase comprising Fe and Pt and a non-magnetic phase including C, wherein in an X-ray diffraction profile obtained by analyzing the sputtering target member by an X-ray diffraction method, the sputtering target member has a carbon-derived diffraction peak at a diffraction angle that satisfies 25.6°≤2θ≤26.2°.
Claims9
A Fe—Pt—C based sputtering target member having a magnetic phase comprising Fe and Pt and a non-magnetic phase comprising C, wherein in an X-ray diffraction profile obtained by analyzing the sputtering target member by an X-ray diffraction method, the sputtering target member has a carbon-derived diffraction peak at a diffraction angle that satisfies 25.6°≤2θ≤26.2°.
A method for manufacturing a sputtering target member, comprising:
- preparing a mixed powder comprising one or both of the following combinations (1) and (2):
- (1) a combination of:
- one or both selected from graphene powder and graphene oxide powder;
- and Fe—Pt alloy powder;
- (2) a combination of:
- one or both selected from graphene powder and graphene oxide powder;
- and Fe powder and Pt powder;
- and
- pressure sintering the mixed powder.
Dependencies are inferred from the claim text.