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US 2024/0410083 A1Published application
Void defect forming method, device, and diamond manufacturing method
AssigneeKyoto University
InventorsNorikazu MIZUOCHI, Masanori FUJIWARA, Masaki HASHIDA, Shunsuke INOUE, Shin-ichiro MASUNO
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Abstract
Provided is a method for forming a vacancy defect in diamond, including the step of concentrating pulsed light from a pulsed laser to irradiate the diamond with the pulsed light, wherein the fluence of the pulsed laser in a focal region on the diamond is 1.8 J·cm−2 or more.
Claims10
A method for forming a vacancy defect in diamond, comprising the step of concentrating pulsed light from a pulsed laser to irradiate the diamond with the pulsed light,
- wherein a fluence of the pulsed laser in a focal region on the diamond is 1.8 J·cm−2 or more.
An apparatus for forming a vacancy defect in diamond, comprising
- a pulsed laser, and
- an optical system configured to concentrate pulsed light from the pulsed laser to irradiate the diamond with the pulsed light,
- wherein a fluence of the pulsed laser in a focal region on the diamond is 1.8 J·cm−2 or more.
Dependencies are inferred from the claim text.