Oled sub-pixel circuit formation and structure

A method, comprising:

• positioning a substrate, the substrate comprising one or more unit pixels, wherein each of the one or more unit pixels comprises a sub-pixel opening, wherein each sub-pixel opening comprises an anode, wherein each of the one or more unit pixels is partially surrounded by a plurality of walls, wherein the plurality of walls define a plurality of gaps, and wherein the plurality of walls and the plurality of gaps define the one or more unit pixels;
• depositing a first portion of OLED material on a first portion of the one or more unit pixels at a first orientation, the first orientation formed by a first position of the substrate and a first orientation of an evaporation deposition source;
• depositing a second portion of OLED material on a second portion of the one or more unit pixels at a second orientation, the second orientation formed by a second position of the substrate and a second orientation of the evaporation deposition source;
• depositing a third portion of OLED material on a third portion of the one or more unit pixels at a third orientation, the third orientation formed by a third position of the substrate and a third orientation of the evaporation deposition source;
• and
• disposing a cathode over the first portion of OLED material, the second portion of OLED material, and the third portion of OLED material.

A sub circuit, comprising:

• a substrate;
• a pixel defining layer (PDL) disposed over the substrate, the PDL exposing anodes disposed over the substrate;
• and
• a Y-shaped wall disposed over the PDL, wherein the Y-shaped wall partially surrounds a unit pixel, wherein the unit pixel comprises three sub-pixels.