Three-dimensional memory device and formation method thereof
AssigneeYangtze Memory Technologies Co., Ltd.
InventorsKun Zhang, Linchun Wu, Wenxi Zhou, Zhiliang Xia
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AssigneeYangtze Memory Technologies Co., Ltd.
InventorsKun Zhang, Linchun Wu, Wenxi Zhou, Zhiliang Xia
Estimating the term…
Methods, devices, and systems for three-dimensional (3D) memory devices are provided. In one aspect, a method for forming a three-dimensional (3D) semiconductor device includes: forming a first stack structure including a plurality of alternating sacrificial layers and dielectric layers, the first stack structure having a first region and a second region; forming gate line slits extending through the first stack structure in the first region and the second region; forming a contact via extending to a target sacrificial layer in the second region; forming cavities coupled to the contact via through the gate line slits; and forming conductive layers in replace of the sacrificial layers in the cavities and a contact in the contact via by depositing a conductive material in the contact via and the cavities. The 3D semiconductor device includes a second stack structure having the conductive layers and the dielectric layers.
A method for forming a three-dimensional (3D) semiconductor device, the method comprising:
A three-dimensional (3D) memory device, comprising:
A memory system, comprising:
Dependencies are inferred from the claim text.