Laser apparatus, method for measuring spectral linewidth, and method for manufacturing electronic devices

A method for measuring a spectral linewidth, the method comprising:

• changing a center wavelength of pulse laser light in accordance with a target wavelength that periodically changes to each of multiple values including first and second wavelengths;
• calculating a first spectral linewidth from data on spectra of multiple pulses each having the first wavelength as the target wavelength;
• and
• calculating a second spectral linewidth from data on spectra of multiple pulses each having the second wavelength as the target wavelength.

A method for manufacturing electronic device, the method comprising:

• generating pulse laser light by using a laser apparatus;
• outputting the pulse laser light to an exposure apparatus;
• and
• exposing a photosensitive substrate with the pulse laser light in the exposure apparatus to manufacture the electronic devices,
• the laser apparatus including
• a laser oscillator including a wavelength adjuster and configured to output the pulse laser light having a center wavelength adjusted by the wavelength adjuster,
• a spectrum monitor configured to generate data on a spectrum of the pulse laser light, and
• a processor configured to
• control the wavelength adjuster in such a way that the center wavelength of the pulse laser light changes in accordance with a target wavelength that periodically changes to each of multiple values including first and second wavelengths,
• calculate a first spectral linewidth from data on spectra of multiple pulses each having the first wavelength as the target wavelength, and
• calculate a second spectral linewidth from data on spectra of multiple pulses each having the second wavelength as the target wavelength.