Substrate processing apparatus

A substrate processing apparatus, comprising:

• a processing chamber, having a liquid inlet and a liquid outlet;
• a liquid supply tank, having a first liquid inlet, a second liquid inlet and a liquid outlet;
• a recovery tank, having a first liquid inlet, a second liquid inlet and a liquid outlet;
• a first pipeline, configured to connect the first liquid inlet and the liquid outlet of the liquid supply tank, so as to circulate the chemical liquid inside the liquid supply tank;
• a second pipeline, configured to connect the first pipeline and the liquid inlet of the processing chamber, so as to transfer the chemical liquid in the liquid supply tank to the processing chamber;
• a third pipeline, configured to connect the first pipeline and the first liquid inlet of the recovery tank, so as to transfer the chemical liquid in the liquid supply tank to the recovery tank;
• a fourth pipeline, configured to connect the liquid outlet of the processing chamber and the second liquid inlet of the recovery tank, so as to return the used chemical liquid in the processing chamber to the recovery tank;
• a fifth pipeline, configured to connect the liquid outlet of the recovery tank and the second liquid inlet of the liquid supply tank, so as to transfer the chemical liquid in the recovery tank back to the liquid supply tank;
• wherein, the temperature of the chemical liquid transferred to the recovery tank through the third pipeline is higher than that of the chemical liquid transferred to the recovery tank through the fourth pipeline.