Wet cleaning method

A method, comprising:

• placing a semiconductor wafer in a chamber during a semiconductor fabrication process;
• providing a semiconductor cleaning apparatus, the semiconductor cleaning apparatus comprising:
• a first inlet configured to receive a carrier gas;
• a gas passageway connected to the first inlet, the gas passageway comprising at least one gas passage branch including a first gas passage branch;
• a second inlet configured to receive one or more fluids;
• and
• a fluid passageway connected to the second inlet, the fluid passageway comprising at least one fluid passage branch including a first fluid passage branch, the first gas passage branch being arranged neighboring the first fluid passage branch;
• delivering the carrier gas from the first inlet to the at least one gas passage branch through the gas passageway;
• spraying the carrier gas onto the semiconductor wafer;
• delivering the one or more fluids from the second inlet to the at least one fluid passage branch through the fluid passageway;
• and
• spraying the one or more fluids onto the semiconductor wafer.

A method, comprising:

• placing a semiconductor wafer in a chamber during a semiconductor fabrication process;
• providing a semiconductor cleaning apparatus, the semiconductor cleaning apparatus comprising:
• a first inlet configured to receive a carrier gas;
• a gas passageway connected to the first inlet, the gas passageway comprising a plurality of gas passage branches including a first gas passage branch;
• a second inlet configured to receive one or more fluids;
• and
• a fluid passageway connected to the second inlet, the fluid passageway comprising a plurality of fluid passage branches including a first fluid passage branch;
• delivering the carrier gas from the first inlet to the plurality of gas passage branches through the gas passageway;
• spraying the carrier gas onto the semiconductor wafer;
• delivering the one or more fluids from the second inlet to the plurality of fluid passage branch through the fluid passageway;
• and
• spraying the one or more fluids onto the semiconductor wafer.