Back to results
US 2024/0404834 A1Published application
Methods and systems for improving plasma ignition stability
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsPing-Hsun Lin, Hung-Yi Tsai, Hao-Ping Cheng, Ta-Cheng Lien, Hsin-Chang Lee
Life of this patent
Estimating the term…
Abstract
Methods for plasma stability in a plasma treatment tool are disclosed. A laser is positioned within a plasma treatment chamber within a skin depth of the electromagnetic field generated therein. The laser can be synchronized with the electrical triggering signals that generate the electromagnetic field. This scheme provides a stable and efficient method of plasma ignition.
Claims20
A plasma treatment chamber in a plasma treatment tool, comprising:
- a wafer support pedestal having a wafer support surface and configured to support a substrate;
- and
- an optical module comprising a laser whose light path passes through the plasma treatment chamber above the wafer support pedestal.
A plasma treatment tool, comprising:
- a housing containing a plasma treatment chamber;
- a gas inlet for introducing one or more process gases into the plasma treatment chamber;
- an optical module comprising a laser whose light path passes through the plasma treatment chamber;
- a wafer support pedestal having a wafer support surface and configured to support a substrate within the plasma treatment chamber;
- an upper electrode above the wafer support pedestal;
- a dielectric window separating the upper electrode from the plasma treatment chamber;
- and
- a lower electrode below the wafer support surface.
5 more elements
A plasma treatment tool, comprising:
- a housing containing a plasma treatment chamber;
- a wafer support pedestal having a wafer support surface and configured to support a substrate within the plasma treatment chamber;
- a plurality of electrodes configured to produce an electrical field above the wafer support pedestal;
- and
- an optical module comprising a laser whose light path will pass through the electrical field.
2 more elements
Dependencies are inferred from the claim text.