Plasma processing apparatus, control method, and storing medium
AssigneeTokyo Electron Limited
InventorsMikio SATO, Eiki KAMATA, Taro IKEDA, Nobuhiko YAMAMOTO
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Abstract
A plasma processing apparatus includes a control device and configured to plasmarize a gas supplied to an interior of a processing container to perform a plasma processing on an object to be processed, wherein the control device includes: a measurer configured to measure an electron energy distribution function of plasma in the interior of the processing container, and a parameter changer configured to change parameters relating to the plasma processing so that the electron energy distribution function measured by the measurer during the plasma processing approaches a target electron energy distribution function.
Claims14
-12. (canceled)
A plasma processing apparatus comprising a control device and configured to plasmarize a gas supplied to an interior of a processing container to perform a plasma processing on an object to be processed,
- wherein the control device includes:
- a measurer configured to measure an electron energy distribution function of plasma in the interior of the processing container;
- and
- a parameter changer configured to change parameters relating to the plasma processing so that the electron energy distribution function measured by the measurer during the plasma processing approaches a target electron energy distribution function.
A method of controlling a plasma processing apparatus including a control device and configured to plasmarize a gas supplied to an interior of a processing container to perform plasma processing on an object to be processed,
- wherein the control device performs operations of:
- measuring an electron energy distribution function of plasma in the interior of the processing container;
- and
- changing parameters relating to the plasma processing so that the electron energy distribution function measured during the plasma processing approaches a target electron energy distribution function.
A non-transitory computer-readable recording medium storing a program for executing, in a control device configured to control a plasma processing apparatus which plasmarizes a gas supplied to an interior of a processing container to perform plasma processing on an object to be processed, a procedure of:
- measuring an electron energy distribution function of plasma in the interior of the processing container;
- and
- changing parameters relating to the plasma processing so that the electron energy distribution function measured during the plasma processing approaches a target electron energy distribution function.
Dependencies are inferred from the claim text.