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US 2024/0404801 A1Published application
Plasma treatment apparatus
AssigneePlasma Ion Assist Co., Ltd.
InventorsMasanori WATANABE, Yasuo SUZUKI
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Abstract
A plasma treatment apparatus is constituted by a treated base material at a ground potential in a plasma treatment chamber and an inductive coupling antenna unit disposed to face the base material, and a bias electrode which modulates a plasma potential is provided between them. In addition, an in-line type plasma treatment apparatus in which a plurality of the treatment chambers are connected is provided.
Claims10
A plasma treatment apparatus, comprising:
- a plasma treatment chamber in which a treated base material at a ground potential is accommodated;
- a conveyance part which conveys the treated base material in the plasma treatment chamber;
- an inductive coupling antenna unit configured to generate plasma;
- and
- a bias electrode which applies a bias voltage to the plasma,
- wherein the bias electrode is disposed around a plasma generation region in which the plasma is generated.
3 more elements
Dependencies are inferred from the claim text.