Semiconductor processing apparatus
AssigneeHitachi High-Tech Corporation
InventorsMasahiro KAMIGAKI, Motohiro TAKAHASHI, Masaki MIZUOCHI, Masashi FUJITA, Takumi NAGAYAMA
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AssigneeHitachi High-Tech Corporation
InventorsMasahiro KAMIGAKI, Motohiro TAKAHASHI, Masaki MIZUOCHI, Masashi FUJITA, Takumi NAGAYAMA
Estimating the term…
A plurality of load lock chambers are provided, a predetermined valve device is controlled such that the valve device is not operated during wafer processing, a signal for permitting operation of the predetermined valve device is transmitted at a timing when the wafer processing is completed, and the valve device is operated based on the signal. Thus, while a processed wafer and an unprocessed wafer are exchanged between one load lock chamber and a processing chamber, an operation sequence of the entire semiconductor processing apparatus is controlled such that a predetermined valve device in the other load lock chamber is operated, and thus vibration does not occur during the operation of an electron optical system, thereby reducing a waiting time.
A semiconductor processing apparatus comprising:
Dependencies are inferred from the claim text.