Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and compound

Abstract

An actinic ray-sensitive or radiation-sensitive resin composition comprising a compound (Q) represented by a formula (I-1) below and a resin having a polarity that increases through decomposition by an action of an acid, wherein, in the formula (I-1), R1 represents a hydrocarbon group having at least one or more fluorine atoms, R2 represents an aromatic group, Y represents —SO2— or —CO—, and X+ represents a counter cation.

Dependencies are inferred from the claim text.