Substrate processing apparatus and method of adjusting substrate transfer position
AssigneeTokyo Electron Limited
InventorsShota UMEZAKI, Kouji KIMOTO, Masato OZEKI, Ryosuke KENZAKI
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AssigneeTokyo Electron Limited
InventorsShota UMEZAKI, Kouji KIMOTO, Masato OZEKI, Ryosuke KENZAKI
Estimating the term…
A substrate processing apparatus includes a process mechanism that processes a substrate. The process mechanism includes: a processing container that accommodates therein the substrate; a first supporting member that horizontally supports the substrate; and a second supporting member that horizontally supports the substrate at an outside of the processing container. The first supporting member and the second supporting member support the substrate such that a center axis of the substrate in the processing container and a center axis of the substrate at an outside of the processing container match, in a case where at least viewed from a direction where the substrate is carried-in to the container and carried-out from the container.
A substrate processing apparatus comprising:
A transfer position adjusting method to be executed in a substrate processing apparatus including:
Dependencies are inferred from the claim text.