Polishing composition
OwnerYoshio MORI, Yuichiro NAKAGAI +1inventors
InventorsYoshio MORI, Yuichiro NAKAGAI, Hiroyuki ODA
Life of this patent
Estimating the term…
Abstract
A polishing composition that can achieve an excellent polishing removal rate for an object to be polished is provided. The polishing composition used for polishing the object to be polished is provided. The polishing composition contains water, and sodium permanganate as an oxidant. In some preferred embodiments, the polishing composition further contains a metal salt selected from salts each of which has a cation containing a metal belonging to Groups 3 to 16 in the periodic table, and an anion. The polishing composition can also be preferably used to polish an object to be polished formed of a high hardness material having a Vickers hardness of 1500 Hv or more.
Claims11
A polishing composition comprising sodium permanganate as an oxidant, and water.
Dependencies are inferred from the claim text.