Substrate processing apparatus and substrate processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorsTakuma TAKAHASHI, Ryo MURAMOTO, Kazuki NAKAMURA, Kazuki CHIBA
Life of this patent
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Abstract
A substrate processing apparatus includes a substrate holder that holds an outer peripheral end of a substrate, a processor that processes a front surface or a back surface of the substrate, and a holding controller that controls the substrate holder such that a center portion of the substrate is displaced in an upward direction or a downward direction in a period during which the substrate is processed by the processor.
Claims8
A substrate processing apparatus comprising:
- a substrate holder that holds an outer peripheral end of a substrate;
- a processor that processes a front surface or a back surface of the substrate;
- and
- a holding controller that controls the substrate holder such that a center portion of the substrate is displaced in an upward direction or a downward direction in a period during which the substrate is processed by the processor.
A substrate processing apparatus, comprising:
- a substrate holder that holds an outer peripheral end of a substrate;
- a displacement sensor that detects displacement of a center portion of the substrate;
- and
- a holding controller that controls the substrate holder such that the center portion of the substrate is displaced in an upward direction or a downward direction, wherein
- the holding controller, based on displacement detected by the displacement sensor, displaces the center portion of the substrate in the upward direction or the downward direction such that displacement of the center portion of the substrate held by the substrate holder falls within a predetermined range.
A substrate processing method that is to be performed in a substrate processing apparatus, the substrate processing apparatus comprising:
- a substrate holder that holds an outer peripheral end of a substrate;
- and
- a processor that processes a front surface or a back surface of the substrate, and
- the substrate processing method including a holding control step of controlling the substrate holder such that a center portion of the substrate is displaced in an upward direction or a downward direction in a period during which the substrate is processed by the processor.
A substrate processing method that is to be performed in a substrate processing apparatus, the substrate processing apparatus comprising:
- a substrate holder that holds an outer peripheral end of a substrate;
- and
- a displacement sensor that detects displacement of a center portion of the substrate;
- and
- a holding controller that controls the substrate holder such that the center portion of the substrate is displaced in an upward direction or a downward direction, and
- the substrate processing method including controlling the substrate holder, based on displacement detected by the displacement sensor, to displace the center portion of the substrate in the upward direction or the downward direction such that displacement of the center portion of the substrate held by the substrate holder falls within a predetermined range.
Dependencies are inferred from the claim text.