Systems and methods of isolation of gallium-68
OwnerJoel Oscar Olsson KUMLINinventor
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Abstract
A process for the preparation of a carrier-free Ga-68 solution from an irradiated Zn target. systems comprising components used in the process, and compositions comprising Ga-68 prepared by the process. Purification of Ga-68 is carried out by feeding an irradiation target solution comprising Zn-68, Ga-68 and solid target assembly metals into a system comprising three chromatography columns in succession.
Claims44
A process for preparation of a carrier-free Ga-68 solution from a solid target assembly, the process comprising:
- adsorbing an irradiation target solution to a first chromatography column comprising a first chromatographic resin;
- washing the first chromatography column with a first chromatography wash solution;
- eluting a first eluate solution from the first chromatography column with a first chromatography column elution solution;
- adsorbing the first eluate solution to a second chromatography column comprising a second chromatography resin;
- collecting a second chromatography column flow-through solution from the second chromatography column;
- adsorbing the second chromatography column flow-through solution to a third chromatography column comprising a third chromatography resin;
- and
- eluting the carrier-free Ga-68 solution from the third chromatography column with a third chromatography column elution solution;
- wherein the irradiation target solution comprises a solution formed by dissolution of at least a portion of an irradiation target portion of a solid target assembly;
- wherein the irradiation target solution comprises Zn-68, Ga-68 , and solid target assembly metals;
- wherein the solid target assembly comprises a metal disc comprising front and rear surfaces, and the irradiation target portion disposed on the top surface of the disc;
- wherein the irradiation target portion comprises a mixture of Zn-68 and Ga-68;
- wherein the first chromatography resin comprises a hydroxamate chromatography resin;
- wherein the first chromatography column wash solution has a strong acid present at a concentration of greater than about 4.5 M;
- wherein the first chromatography column elution solution has a strong acid present at a concentration of less than about 3.5 M;
- wherein the second chromatography resin comprises an alkyl phosphine oxide chromatography resin;
- wherein the third chromatography resin comprises an alkyl orthophosphoric acid chromatography resin;
- and
- wherein the third chromatography column elution solution is optionally comprises a strong acid present at a concentration less than about 0.2 M.
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Dependencies are inferred from the claim text.