Semiconductor process device and gas inlet apparatus
AssigneeBeijing Naura Microelectronics Equipment Co., Ltd.
InventorGang XU
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Abstract
A gas inlet apparatus of a semiconductor process device for passing process gases into a process chamber, includes: a gas inlet block assembly and a connection assembly, both being made of anti-corrosion materials. The gas inlet block assembly is hermetically connected to an upper cover of the process chamber, a gas mixing chamber, a gas transport channel, and a gas mixing channel are formed in the gas inlet lock assembly, a gas inlet of the gas transport channel is connected to the gas mixing chamber, and a gas outlet of the gas transport channel is connected to the process chamber. The gas mixing channel includes a plurality of gas inlets being formed on an outer surface of the gas inlet block assembly, and a gas outlet of the gas mixing channel is connected to the gas mixing chamber.
Claims20
A gas inlet apparatus of a semiconductor process device for passing process gases into a process chamber, comprising:
- a gas inlet block assembly;
- and
- a connection assembly, both being made of anti-corrosion materials;
- wherein:
- the gas inlet block assembly is hermetically connected to an upper cover of the process chamber, a gas mixing chamber, a gas transport channel, and a gas mixing channel are formed in the gas inlet lock assembly, a gas inlet of the gas transport channel is connected to the gas mixing chamber, and a gas outlet of the gas transport channel is connected to the process chamber;
- the gas mixing channel includes a plurality of gas inlets being formed on an outer surface of the gas inlet block assembly, and a gas outlet of the gas mixing channel is connected to the gas mixing chamber;
- and
- the connection assembly includes a plurality of connection assemblies disposed on the gas inlet block assembly, the plurality of connection assemblies are connected to the plurality of gas inlets of the gas mixing channel in a one-to-one correspondence, the plurality of connection assemblies are used to connect to a plurality of process gas supply sources in a one-to-one correspondence, and each connection assembly is used to selectively introduce or stop the process gases into the gas mixing channel.
A semiconductor process device, comprising a process chamber and a gas inlet apparatus for passing process gases into a process chamber, wherein the gas inlet apparatus comprises:
- a gas inlet block assembly;
- and
- a connection assembly, both being made of anti-corrosion materials;
- wherein:
- the gas inlet block assembly is hermetically connected to an upper cover of the process chamber, a gas mixing chamber, a gas transport channel, and a gas mixing channel are formed in the gas inlet lock assembly, a gas inlet of the gas transport channel is connected to the gas mixing chamber, and a gas outlet of the gas transport channel is connected to the process chamber;
- the gas mixing channel includes a plurality of gas inlets being formed on an outer surface of the gas inlet block assembly, and a gas outlet of the gas mixing channel is connected to the gas mixing chamber;
- and
- the connection assembly includes a plurality of connection assemblies disposed on the gas inlet block assembly, the plurality of connection assemblies are connected to the plurality of gas inlets of the gas mixing channel in a one-to-one correspondence, the plurality of connection assemblies are used to connect to a plurality of process gas supply sources in a one-to-one correspondence, and each connection assembly is used to selectively introduce or stop the process gases into the gas mixing channel.
Dependencies are inferred from the claim text.