Method for depositing carbon on a substrate
AssigneeHydromecanique Et Frottement
InventorsMarie-Alix LEROY, Michaël OUGIER
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Abstract
The invention relates to a method for depositing a carbon-based material from a target onto a metal substrate, by ion-assisted cathode sputtering. According to the invention, the ratio between the flow of ions that is directed toward the substrate and the flow of neutral carbon atoms that is directed toward the substrate is adjusted to between 1.7 and 3.5; and a bias voltage of between −35 V and −100 V is applied to the substrate.
Claims20
A method for depositing, with ion assistance, of an outer layer of a carbon-based material (M) from a target onto a metal substrate (S), by cathode sputtering, wherein the ratio between the flow of ions ((i) directed toward the substrate (S) and the flow ((φn) of neutral carbon atoms directed toward the substrate (S) is adjusted between 1.7 and 3.5, and a bias voltage of between −35V and −100V is applied to the substrate (S).
Dependencies are inferred from the claim text.