Scalable nanoimprint manufacturing of functional multi-layer metasurface devices
AssigneeArizona Board of Regents on behalf of Arizona State University
InventorsChao WANG, Yu YAO, Shinhyuk CHOI, Jiawei ZUO
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Abstract
A polarimetric metastructure is disclosed that includes a metasurface structure, one or more vertically coupled double-layer metallic gratings, and a dielectric spacer layer between the metasurface structure and the vertically coupled double-layer metallic gratings.
Claims19
A polarimetric metastructure comprising:
- a metasurface structure;
- one or more vertically coupled double-layer metallic gratings;
- and
- a dielectric spacer layer between the metasurface structure and the vertically coupled double-layer metallic gratings.
A method of fabricating polarimetric metastructures, the method comprising:
- performing a first nanoimprint lithography step to produce metasurface structures;
- determining structural parameters of vertically coupled double-layer metallic gratings, wherein the structural parameters comprise a grating period (p), a grating height (h), a metal thickness (t), and a gap (g) for targeted polarimetric performance;
- determining a dielectric spacer thickness (d);
- performing a second nanoimprint lithography step to create a scaffold of the vertically coupled double-layer metallic gratings on top of a fabricated metasurface structure;
- and
- depositing metal on vertically coupled double-layer metallic gratings resist polymer with a designed thickness (t).
A method of alignment of two sets of gratings of slightly different periods (P1 and P2) that are designed in a metasurface and a vertically coupled double-layer metallic gratings (VCDG) structure, the method comprising:
- during a NIL process, arranging a substrate and a mold to a distance that is less than 10 μm where Moiré fringes are formed under white light illumination due to interference of two sets of gratings.
Dependencies are inferred from the claim text.