Hybrid apparatus, system and techniques for mass analyzed ion beam

An ion beam processing system, comprising:

• an ion source, to generate an ion beam as a continuous ion beam;
• an electrodynamic mass analysis (EDMA) assembly, disposed downstream of the ion source, and comprising:
• a first upper electrode, disposed above a beam axis;
• and
• a first lower electrode, disposed below the beam axis, opposite the first upper electrode, the EDMA assembly arranged to receive a first RF voltage signal at a first frequency;
• a deflection assembly, disposed downstream to the EDMA assembly, the deflection assembly comprising a blocker, disposed along the beam axis;
• and
• an energy spread reducer (ESR), disposed downstream to the deflection assembly, the ESR arranged to receive a second RF voltage signal at a second frequency, twice the first frequency, the energy spread reducer comprising:
• an upper ESR electrode, disposed above the beam axis;
• and
• a lower ESR electrode, disposed below the beam axis.

A method, comprising:

• directing an ion beam as a continuous ion beam into an EDMA assembly, comprising a first upper electrode and a first lower electrode;
• applying a first RF voltage signal applied at a first frequency to the ion beam in the EDMA assembly, while the ion beam is transported through EDMA assembly;
• blocking a path of a portion of the ion beam along a beam axis at a position downstream to the EDMA assembly, using a blocker, wherein a mass analyzed bunched ion beam is generated;
• and
• applying an accelerating RF voltage signal to the mass analyzed bunched ion beam as the bunched ion beam passes through an energy spread reducer, wherein the accelerating RF voltage signal is applied at a second frequency, twice the first frequency.