Gas injector for epitaxy and cvd chamber

A process chamber for substrate processing comprising:

• an upper lamp module;
• a lower lamp module;
• a substrate support for supporting a substrate, the substrate support disposed between the upper lamp module and the lower lamp module;
• a chamber body assembly disposed between the upper lamp module and the lower lamp module, the chamber body assembly comprising:
• an injector passage disposed through the chamber body assembly;
• a gas injector disposed within the injector passage, the gas injector positioned to provide a gas that flows across the substrate;
• and
• a heating element positioned to pre-heat the gas as the gas flows through the gas injector.

A process chamber for substrate processing comprising:

• an upper lamp module;
• a lower lamp module;
• a substrate support for supporting a substrate, the substrate support disposed between the upper lamp module and the lower lamp module;
• a chamber body assembly disposed between the upper lamp module and the lower lamp module, the chamber body assembly comprising:
• an inject ring comprising one or more injector passages disposed through the inject ring;
• and
• a base ring, comprising:
• a substrate transfer passage disposed through the base ring;
• a lower chamber exhaust passage disposed opposite the substrate transfer passage and through the base ring;
• and
• one or more upper chamber exhaust passages, each of the one or more upper chamber exhaust passages having an upper chamber exhaust passage opening disposed above the lower chamber exhaust passage through a top surface of the base ring;
• and
• a gas injector disposed within the one or more injector passages, the gas injector positioned to provide a gas that flows across the substrate;
• and
• a heating element positioned to pre-heat the gas as the gas flows through the gas injector.