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US 2024/0326148 A1Published application
Apparatus and method for wetting a component with a flux
OwnerHarald Geyerinventor
Life of this patent
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Abstract
An apparatus for at least partially wetting a component with a flux. The apparatus includes a flux reservoir that includes a recess that is filled with the flux. The apparatus further includes a viscosity reduction unit that is configured, when the flux reservoir is filled with flux, to reduce the viscosity of the flux at least in a localized region by excitation of the flux.
Claims15
An apparatus for at least partially wetting a component with a flux, the apparatus comprising:
- a flux reservoir including a recess filled with the flux;
- and
- a viscosity reduction unit configured to reduce a viscosity of the flux in the flux reservoir at least in a localized region by excitation of the flux.
A method for at least partially wetting a component with a flux, the method comprising:
- providing a component for at least partial wetting with the flux;
- providing an apparatus for at least partially wetting the component with flux, the apparatus comprising a flux reservoir including a recess filled with the flux and a viscosity reduction unit configured to reduce a viscosity of the flux in the flux reservoir at least in a localized region by excitation of the flux;
- exciting, by the viscosity reduction unit, of the flux such that the viscosity of the flux in the apparatus s reduced at least in the localized region;
- at least partial dipping, the component in the flux such that the component is at least partially wetted with flux;
- and
- providing the component at least partially wetted with flux.
3 more elements
Dependencies are inferred from the claim text.