Gas releasing underlayers for photopatternable organometallic resist
OwnerKazunori Sakai, Tatsuya Kasai +2inventors
InventorsKazunori Sakai, Tatsuya Kasai, Akitaka Nii, Peter de Schepper
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OwnerKazunori Sakai, Tatsuya Kasai +2inventors
InventorsKazunori Sakai, Tatsuya Kasai, Akitaka Nii, Peter de Schepper
Estimating the term…
Gas releasing compositions that can facilitate improved patterning of organometallic resists are described. The gas releasing compositions can release water, carbon dioxide, or alcohols in response to radiation or heating. A film-forming composition is composed of a flowable blend of a reactive gas releasing moiety, a matrix forming species, an organic solvent, and an optional activating agent. An underlayer composition is composed of a blend of a reactive gas releasing moiety, a polymer matrix and an optional activating additive. Multilayer structures are described based on organometallic radiation sensitive patterning compositions, such as alkyl tin oxo-hydroxo compositions, which are placed over a gas releasing underlayer formed on a substrate, such as a semiconductor wafer. Methods for patterning multilayer structures are also described.
A film-forming composition comprising a flowable blend of a reactive gas releasing moiety, a matrix forming species, an organic solvent, and an optional activating additive, wherein the reactive gas releasing moiety releases metal ligand forming molecules in response to radiation or heat, wherein the activating additive is present if the gas releasing moiety releases the reactive gas upon activation stimulated by the activating additive and wherein the matrix forming species comprises a polymer and/or one or more polymer precursors.
A composition comprising a blend of a reactive gas releasing moiety, a polymer matrix, and an optional activating additive, wherein the reactive gas releasing moiety releases metal ligand forming molecules in response to radiation or heat, wherein the activating additive is present if the gas releasing moiety releases the reactive gas upon activation stimulated by the activating additive, and wherein the reactive gas releasing moiety is bound to the polymer matrix or is blended within the polymer matrix.
Dependencies are inferred from the claim text.