Method for preparing cover substrate
AssigneeInnolux Corporation
InventorsYing-Yao TANG, Chin-Lung TING
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Abstract
A method for preparing a cover substrate is provided. The method includes the following steps: providing a substrate with an anti-reflection film formed thereon, wherein the anti-reflection film includes a first layer, and the first layer includes silicon oxide; and treating the first layer of the anti-reflection film with fluoride-based plasma to form a hydrophobic layer on the first layer, wherein a fluorine-containing radical in the fluoride-based plasma is reacted with the silicon oxide in the first layer to form the hydrophobic layer, wherein the fluoride-based plasma is decomposed from a fluoride-based compound by using microwave, and the fluoride-based compound includes NF3 or SF6.
Claims14
A method for preparing a cover substrate, comprising the following steps:
- providing a substrate with an anti-reflection film formed thereon, wherein the anti-reflection film comprises a first layer, and the first layer comprises silicon oxide;
- and
- treating the first layer of the anti-reflection film with fluoride-based plasma to form a hydrophobic layer on the first layer, wherein a fluorine-containing radical in the fluoride-based plasma is reacted with the silicon oxide in the first layer to form the hydrophobic layer,
- wherein the fluoride-based plasma is decomposed from a fluoride-based compound by using microwave, and the fluoride-based compound comprises NF3 or SF6.
Dependencies are inferred from the claim text.