Material comprising a stack of thin layers for thermal insulation and aesthetic properties

A material comprising a transparent substrate deposited with a stack of thin layers on at least one of its surface successively comprising, starting from the substrate:

• a. a first dielectric coating M1 comprising at least one dielectric layer having a thickness ranging between 20 nm and 40 nm;
• b. a first barrier layer having a thickness ranging between 0.1 nm and 5 nm;
• c. a metallic functional layer F1 having a thickness ranging between 8 nm and 11 nm;
• d. a second barrier layer having a thickness ranging between 0.1 nm and 5 nm;
• e. a second dielectric coating M2 comprising at least three dielectric layers having a thickness ranging between 60 nm and 110 nm;
• f. a third barrier layer having a thickness ranging between 0.1 nm and 5 nm;
• g. a metallic functional layer F2 having a thickness ranging between 9 nm and 13 nm;
• h. a fourth barrier layer having a thickness ranging between 0.1 nm and 5 nm;
• i. a third dielectric coating M3 comprising at least three dielectric layers having a thickness ranging between 15 nm and 55 nm, and
• optionally at least one protective layer having a thickness ranging not greater than 5 nm, wherein the material is blue in external reflection (Rext) and has less than 20% reflection internally and externally.

A material comprising a transparent substrate deposited with a stack of thin layers on at least one of its surface successively comprising, starting from the substrate:

• a. a first dielectric coating M1 containing a silicon nitride based dielectric layer;
• b. a first barrier layer based on NiCr, NiCrOx, or NiCrNx;
• c. a metallic functional layer F1 based on silver;
• d. a second barrier layer based on NiCr, NiCrOx, or NiCrNx;
• e. a second dielectric coating M2 containing one silicon nitride based dielectric layer and two other oxide based dielectric layers;
• f. a third barrier layer based on NiCr, NiCrOx, or NiCrNx;
• g. a metallic functional layer F2 based on silver;
• h. a fourth barrier layer based on NiCr, NiCrOx, or NiCrNx;
• i. a third dielectric coating M3 containing two silicon nitride based dielectric layers and one other oxide based dielectric layer;
• and
• j. optionally at least one protective layer having a thickness ranging not greater than 5 nm,
• wherein the material is blue in external reflection (Rext) and has less than 20% reflection internally and externally.