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US 2024/0290577 A1Published application
Substrate processing apparatus and substrate processing method
AssigneeTokyo Electron Limited
InventorsShinya ISHIKAWA, Shinya TAMONOKI, Naoki MATSUMOTO, Naoki MIHARA, Naoki FUJIWARA, Koichi NAGAMI, Nozomu NAGASHIMA, Hiroki ENDO
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Abstract
A substrate processing apparatus comprises a power storage part and at least one unit or member that uses a power. Charges stored in the power storage part are supplied, as a power, to the unit or the member.
Claims18
A substrate processing apparatus comprising:
- a power storage part;
- and
- at least one unit or member that uses a power,
- wherein charges stored in the power storage part are supplied, as a power, to the unit or the member.
1 more element
A substrate processing method for processing a substrate using a substrate processing apparatus,
- wherein the substrate processing apparatus includes a power storage part and at least one unit or member that uses a power, and
- charges from the power storage part are supplied as a power to the unit or the member.
Dependencies are inferred from the claim text.