Method of preparing a surface of a single crystal wafer as an epitaxial template, epitaxial template and device
AssigneeMax-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
InventorsAlexander Everardus Maria SMINK, Wolfgang BRAUN, Johannes BOSCHKER, Lena Nadine MAJER
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Abstract
The invention relates to a method of preparing a surface of a bulk substrate as an epitaxial template, to an epitaxial template and to a device comprising such an epitaxial template.
Claims24
1-23. (canceled)
A method of preparing a surface of a single crystal wafer as an epitaxial template, the surface comprising surface atoms and/or surface molecules, the single crystal wafer comprising a single crystal composed of two or more elements and/or two or more molecules as substrate constituents, each element and molecule respectively having a sublimation rate, the method comprising the steps of:
- providing a single crystal wafer substrate with a defined miscut angle and direction;
- heating the substrate to a temperature at which the surface atoms and/or the surface molecules can reconstruct and/or migrate along the surface to form an arrangement with a minimal step density and step edges oriented according to the predefined miscut angle and miscut direction;
- heating the substrate to a temperature at which atoms or molecules of the substrate constituent having the highest sublimation rate may leave the surface.
Dependencies are inferred from the claim text.