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US 2024/0286102 A1Published application
Bubble Column Reactor
AssigneeLG Chem, Ltd.
InventorsMoon Sub Hwang, Jeong Seok Lee, Hong Min Lee
Life of this patent
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Abstract
Provided is a bubble column reactor including a down chamber provided at a lower portion of the bubble column reactor, a reaction zone provided at an upper portion of the down chamber, a dispersion plate provided between the down chamber and the reaction zone, and a gas supply pipe connected to the down chamber to supply a gaseous reactant, wherein the gas supply pipe includes a spray part extending into the down chamber, wherein the spray part includes a plurality of spray nozzles configured to spray the gaseous reactant to a lower side of the down chamber.
Claims10
A bubble column reactor comprising:
- a down chamber provided at a lower portion of the bubble column reactor;
- a reaction zone provided at an upper portion of the down chamber;
- a dispersion plate provided between the down chamber and the reaction zone;
- and
- a gas supply pipe connected to the down chamber to supply a gaseous reactant,
- wherein the gas supply pipe includes a spray part extending into the down chamber, and
- wherein the spray part includes a plurality of spray nozzles configured to spray the gaseous reactant to a lower side of the down chamber.
4 more elements
Dependencies are inferred from the claim text.