Manufacturing method of electronic device
AssigneeFUJIFILM Corporation
InventorsNorihide SHIMOHARA, Yusuke FUJII, Kazuo KAMOHARA, Kazuhiro YOKOI
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AssigneeFUJIFILM Corporation
InventorsNorihide SHIMOHARA, Yusuke FUJII, Kazuo KAMOHARA, Kazuhiro YOKOI
Estimating the term…
Provided is a manufacturing method of an electronic device, including a step of preparing an electronic substrate including a wiring board, an electronic component, and a ground electrode, a first step of forming an insulating layer on the electronic component, and a second step of forming, on the insulating layer and on the ground electrode, an electromagnetic wave shielding layer that covers the insulating layer and is electrically connected to the ground electrode, to obtain an electronic device, in which, in the first step, the insulating layer is formed by applying an ink for an insulating layer and performing an irradiation with active energy ray on the applied ink for an insulating layer, in the second step, the electromagnetic wave shielding layer is formed by applying an ink for an electromagnetic wave shielding layer, containing a metal compound, and a jetting temperature of the ink for an insulating layer is higher than a jetting temperature of the ink for an electromagnetic wave shielding layer by 10° C. to 40° C.
A manufacturing method of an electronic device, comprising:
Dependencies are inferred from the claim text.