Digital lithography exposure unit boundary smoothing

Abstract

A digital lithography system includes scan regions including a first scan region and a second scan region adjacent to the first scan region. The digital lithography system further includes exposure units located above the scan regions, a memory, and at least one processing device operatively coupled to the memory. The exposure units include a first exposure unit associated with the first scan region and a second exposure unit associated with the second scan region. The processing device is to perform operations including initiating a digital lithography process to pattern a substrate disposed on the stage in accordance with instructions, and performing exposure unit boundary smoothing with respect to the first and second exposure units during the digital lithography process.

Dependencies are inferred from the claim text.