Substrate treatment apparatus

A substrate drying apparatus, comprising:

• a holding unit, configured to hold the substrate in a horizontal state;
• a rotating unit, configured to drive the holding unit and the substrate to rotate around a vertical line passing through the center of the substrate;
• a heating unit, comprising a plurality of fluid supply pipes and a plurality of groups of fluid cartridges, said fluid cartridges distributed parallel to the substrate, the fluid cartridges configured to heat a bottom surface of the substrate, the bottom of the fluid cartridges connected to corresponding fluid supply pipes, the top of the fluid cartridges provided with a plurality of outlet holes, and the region of the substrate heated by the same group of fluid cartridges being a circular ring or a circle;
• a control unit, comprising a controller, a plurality of temperature sensors and a plurality of mass flow meters, said temperature sensors being provided on the holding unit and configured to detect the temperature of the substrate region heated by a corresponding group of fluid cartridges, said mass flow meters being provided on corresponding fluid supply pipes, and said controller being connected to each of the temperature sensors and the mass flow meters;
• and
• an IPA supply unit, configured to spray an IPA drying fluid onto a surface of the substrate.