Gas analyzer apparatus
AssigneeAtonarp Inc.
InventorsNaoki TAKAHASHI, Prakash Sreedhar MURTHY
Life of this patent
Estimating the term…
Abstract
There is provided a gas analyzer apparatus including: a sample chamber which is equipped with a dielectric wall structure and into which only sample gas to be measured is introduced; a plasma generation mechanism that generates plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field applied through the dielectric wall structure; and an analyzer unit that analyzes the sample gas via the generated plasma. By doing so, it is possible to provide a gas analyzer apparatus capable of accurately analyzing sample gases, even those including corrosive gas, over a long period of time.
Claims10
(canceled)
A processing system comprising:
- a processing chamber in which at least one plasma process is carried out;
- a gas analyzer to which a sample gas is supplied from the processing chamber;
- and
- a process controller that controls the at least one plasma process carried out in the processing chamber based on a measurement result of the gas analyzer, wherein the process controller includes a model that has been machine-learned to control the at least one plasma process based on monitoring results of the gas analyzer.
Dependencies are inferred from the claim text.