Distortion of pulses for wafer biasing
AssigneeLam Research Corporation
InventorsKarl Frederick Leeser, John Holland
Life of this patent
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Abstract
Various embodiments herein relate to apparatuses and methods for distortion of pulses for wafer biasing. In some embodiments, a method is provided, the method comprising: causing a distorted pulse to be applied to an electrode of a pedestal such that the distorted pulse at least partially compensates for attenuation between the pedestal and the substrate, and such that a waveform resulting from the distorted pulse, when imparted to the substrate, is substantially square.
Claims41
A method for applying DC pulses to a substrate, the method comprising:
- causing a distorted pulse to be applied to an electrode of a pedestal such that the distorted pulse at least partially compensates for attenuation between the pedestal and the substrate, and such that a waveform resulting from the distorted pulse, when imparted to the substrate, is substantially square.
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An apparatus for applying DC pulses to a substrate, the apparatus comprising at least one controller that is configured to:
- cause a distorted pulse to be applied to an electrode of an Electrostatic Chuck (ESC) such that the distorted pulse at least partially compensates for attenuation between the ESC and the substrate, and such that a waveform resulting from the distorted pulse, when imparted to the substrate, is substantially square.
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A method for applying DC pulses to substrates, the method comprising:
- characterizing a transfer function indicative of attenuation between pedestal and a substrate;
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- identifying one or more parameters to modify a shape of a pulse to be imparted to the substrate as a distorted pulse, such that the distorted pulse at least partially compensates for the attenuation between the pedestal and the substrate, and such that a waveform resulting from the distorted pulse, when imparted to the substrate via an electrode of the pedestal, is substantially square.
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A method for applying periodic waveforms to substrates, the method comprising:
- causing a distorted pulse to be applied to an electrode associated with a pedestal such that the distorted pulse at least partially compensates for attenuation between the pedestal and a substrate, and such that a waveform resulting from the distorted pulse, when imparted to the substrate, has a desired shape that is different from a shape of the distorted pulse, wherein the distorted pulse is generated based at least in part on a transfer function indicative of the attenuation between the pedestal and the substrate.
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Dependencies are inferred from the claim text.