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AssigneeLam Research Corporation
InventorsMichael C. Kellogg, Adam Mace, Alexei Marakhtanov, John Holland, Zhigang Chen, Felix Kozakevich, Alexander Matyushkin
Estimating the term…
Systems and methods for securing an edge ring to a support ring are described. The edge ring is secured to the support ring via multiple fasteners that are inserted into a bottom surface of the edge ring. The securing of the edge ring to the support ring provides stability of the edge ring during processing of a substrate within a plasma chamber. In addition, the securing of the edge ring to the support ring secures the edge ring to the plasma chamber because the support ring is secured to an insulator ring, which is connected to an insulator wall of the plasma chamber. Moreover, the support ring and the edge ring are pulled down vertically using one or more clasp mechanisms during the processing of the substrate and are pushed up vertically using the clasp mechanisms to remove the edge ring and the support ring from the plasma chamber.
An edge ring surrounding a chuck in a plasma processing chamber, the edge ring having an annular body that is configured to be secured over a support ring and disposed at least partially over the chuck and a base ring that surrounds the support ring, comprising:
A plasma chamber comprising:
A plasma chamber comprising:
Dependencies are inferred from the claim text.