Structure comprising under barrier metal and solder layer, and method for producing structure
AssigneeIshihara Chemical Co., Ltd.
InventorsMasaru HATABE, Takahiro TANAKA, Hironori YAMADA
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Abstract
A structure including a solder layer has a substrate, a solder layer formed on the substrate, and an under barrier metal formed as an alloy layer containing Fe and Co between the substrate and the solder layer. An internal stress of the under barrier metal is 260 Mpa or less. The structure having an under barrier metal and a solder layer is produced by successively forming on the substrate, the under barrier metal and the solder layer by a plating method.
Claims4
A structure, comprising:
- a substrate;
- a solder layer formed on the substrate;
- and
- an under barrier metal formed as an alloy layer containing Fe and Co between the substrate and the solder layer,
- wherein internal stress of the under barrier metal is 260 Mpa or less.
A method for producing a structure comprising an under barrier metal and a solder layer by successively forming on a substrate, the under barrier metal and the solder layer by a plating method, the method comprising:
- forming an under barrier metal having internal stress of 260 Mpa or less by using a plating solution that contains water, at least one iron ion supply source, at least one cobalt ion supply source, at least one acid selected from the group consisting of an inorganic acid, an alkane sulfonic acid, and salts of the acids, and at least one stress relaxation agent,
- wherein the plating solution contains the stress relaxation agent in a concentration of 0.5 g/L to 100 g/L.
Dependencies are inferred from the claim text.