Centering device, centering method and substrate processing apparatus

A centering device for positioning a substrate on a substrate support such that a center of the disk-shaped substrate placed in a horizontal posture on an upper surface of the substrate support is aligned with a center of the substrate support, the device comprising:

• a first contact member movable in a first horizontal direction from a first reference position separated from the center of the substrate support by a reference distance longer than a radius of the substrate toward the center of the substrate support in a horizontal plane;
• a second contact member movable in a second horizontal direction from a second reference position deviated from a virtual line extending in the first horizontal direction from the center of the substrate support and separated from the center of the substrate support by the reference distance on a side opposite to the first contact member with respect to the center of the substrate support in the horizontal plane, the second horizontal direction being different from a direction toward the center of the substrate support and extending toward the substrate;
• a third contact member movable in a third horizontal direction from a third reference position separated from the center of the substrate support by the reference distance on a side opposite to the first contact member with respect to the center of the substrate support and opposite to the second contact member with respect to the virtual line in the horizontal plane, the third horizontal direction being different from a direction toward the center of the substrate support and extending toward the substrate;
• a moving mechanism configured to move the first contact member, the second contact member and the third contact member respectively in the first horizontal direction, the second horizontal direction and the third horizontal direction;
• a rotation driver configured to rotate the substrate support having the substrate placed thereon,
• a meter configured to measure a peripheral edge part of the substrate placed on the substrate support with the first contact member, the second contact member and the third contact member separated from an end surface of the substrate;
• and
• a controller configured to perform an aligning the substrate with respect to the substrate support by controlling the moving mechanism and the rotation driver, wherein
• the controller includes:
• an eccentricity information acquirer configured to acquire a direction of eccentricity of the center of the substrate from the center of the substrate support based on peripheral edge information about the peripheral edge part of the substrate measured by the meter;
• a substrate posture adjuster configured to adjust a posture of the substrate such that the direction of eccentricity is parallel to the virtual line by rotating the substrate support;
• and
• a movement controller configured to repeat minute movements of moving the first contact member, the second contact member and the third contact member respectively by a first movement amount, a second movement amount and a third movement amount until contact of all of the first contact member, the second contact member and the third contact member with the substrate is completed so that distances of the first contact member, the second contact member and the third contact member from the center of the substrate support are kept equal in a state where the direction of eccentricity is parallel to the virtual line.