Semiconductor wafer cleaning device, semiconductor wafer cleaning method, and method for manufacturing silicon wafer

A semiconductor wafer cleaning apparatus comprising:

• a disk-shaped rotary table having a circular opening in the center and positioned horizontally;
• a wafer holder provided on the top surface of the rotary table to hold a semiconductor wafer to be cleaned;
• a cylindrical return portion provided on the bottom surface of the rotary table;
• a nozzle head having a centrally located inverted conical recess, and a horizontal portion disposed horizontally on the radially outer side of the recess, opposite to the bottom surface of the rotary table;
• a lower chemical supply nozzle provided in the recess of the nozzle head to supply chemical solution toward the back surface of the semiconductor wafer through the opening;
• and
• a wafer back surface rinse nozzle provided in the recess of the nozzle head to supply pure water toward the back surface of the semiconductor wafer through the opening;
• wherein,
• the return portion is disposed near the opening, and
• a return portion rinse nozzle is provided in the recess of the nozzle head to supply pure water toward the return portion to rinse the return portion.