Forming optical components using selective area epitaxy
AssigneeXerox Corporation
InventorThomas Wunderer
Life of this patent
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Abstract
A mask material is deposited on a substrate or growth template. The substrate or growth template is compatible with crystalline growth of a crystalline optical material. Patterned portions of the mask material are removed to expose one or more regions of the substrate or growth template. The one or more regions have target shapes of one or more optical components. The crystalline optical material is selectively grown in the one or more regions to form the one or more optical components.
Claims20
A method of forming a passive optical component of a photonic integrated circuit, comprising:
- depositing a mask material on a substrate or growth template, the substrate or growth template compatible with crystalline growth of a crystalline optical material, the mask material deposited to a thickness that corresponds to a height of the passive optical component;
- removing a patterned portion of the mask material to expose a region of the substrate or growth template, the region having a target shape of the passive optical component;
- and
- selectively growing the crystalline optical material in the region to the height to form the passive optical component.
A method of forming an optical component, comprising:
- depositing a mask material on a substrate or growth template, the substrate or growth template compatible with crystalline growth of a crystalline optical material, the mask material deposited to a thickness that does not exceed a height of the optical component;
- removing a patterned portion of the mask material to expose a region of the substrate or growth template, the region having a target shape of the optical component;
- etching into the substrate or growth template to form a trench corresponding to the target shape;
- and
- selectively growing the crystalline optical material in the trench to form the optical component.
Dependencies are inferred from the claim text.