Composite polishing pad including carbon nanotubes, and method for producing same

A method for producing a composite polishing pad for CMP, comprising:

• (a) scattering carbon nanotubes on a mold having a plurality of protrusions engraved therein so that some thereof overlap each other;
• (b) forming a polymer substrate layer with a flat upper surface by coating a polymer on the upper portion of the carbon nanotubes;
• and
• (c) demolding the mold.

A method for producing a composite polishing pad for CMP, comprising:

• (a) scattering carbon nanotubes on a substrate so that some thereof overlap each other;
• (b) forming a polymer substrate layer with a flat upper surface by coating a polymer on the upper portion of the carbon nanotubes;
• (c) separating and removing the substrate from the carbon nanotubes;
• and
• (d) forming a plurality of protrusions including the polymer substrate layer and the carbon nanotube layer in an irregular net form structure by conducting an embossing treatment on the substrate-removed surface.