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US 2024/0253091 A1Published application
Systems and methods to clean a continuous substrate
AssigneeIllinois Tool Works Inc.
InventorGregory T. Hall
Life of this patent
Estimating the term…
Abstract
An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and drying the continuous substrate.
Claims21
1-20. (canceled)
A system to clean a continuous substrate, the system comprising:
- a plurality of first high pressure, low flow nozzles located in a first volume, each of the first high pressure, low flow nozzles configured to spray a first high pressure, low flow spray of a first cleaning fluid at a first side of the continuous substrate to remove particulate matter from the continuous substrate;
- an agitation bath comprising at least one of a megasonic transducer or an ultrasonic transducer configured to direct energy at the continuous substrate within the agitation bath;
- a plurality of rollers configured to transport the continuous substrate from the first volume to a second volume having the agitation bath;
- and
- a dryer configured to dry the continuous substrate.
2 more elements
Dependencies are inferred from the claim text.