Sublimation gas supply system and sublimation gas supply method with buffer tank

A sublimation gas supply system for supplying solid material sublimation gas to a subsequent process, the sublimation gas supply system comprising:

• a 1st vessel configured to house a 1st solid material;
• a 1st heater configured to heat said 1st vessel so that said 1st solid material sublimates to produce a 1st sublimation gas;
• a 1st buffer tank configured to store sublimation gas;
• a 1st channel configured to introduce said 1st sublimation gas into said 1st buffer tank;
• a 2nd channel configured to supply said 1st sublimation gas, delivered from said 1st buffer tank, to a subsequent process;
• a dilution gas channel configured to connect to a 1st connector in said 2nd channel, for introducing dilution gas into said 2nd channel;
• a 1st flow control device configured to control flow, provided between said 1st connector and said 1st buffer tank on said 2nd channel;
• a 2nd flow control device configured to control flow, provided on said dilution gas channel;
• and
• a mixing vessel, provided on said 2nd channel, configured to mix said dilution gas and said 1st sublimation gas brought together by means of said 1st connector.

A sublimation gas supply method for supplying solid material sublimation gas to a subsequent process, the sublimation gas supply method comprising:

• a 1st heating step, wherein a 1st vessel configured to house a 1st solid material is heated to produce a 1st sublimation gas from the 1st solid material;
• a 1st introduction step, wherein said 1st sublimation gas is introduced into a 1st buffer tank;
• a 1st supply step, wherein said 1st sublimation gas delivered from said 1st buffer tank is supplied to a subsequent process;
• a 1st dilution step, wherein dilution gas is supplied to said 1st sublimation gas delivered from said 1st buffer tank;
• a 1st flow control step, wherein the flow of said 1st sublimation gas delivered from said 1st buffer tank is controlled;
• and
• a 2nd flow control step, wherein the flow of said dilution gas supplied from a dilution gas channel is controlled.