Treatment solution and treatment method
AssigneesKabushiki Kaisha Toshiba, Tohoku University
InventorsKenya UCHIDA, Hiroyuki FUKUI, Ikuo UEMATSU, Takeaki IWAMOTO, Eunsang KWON
Life of this patent
Estimating the term…
Abstract
According to one embodiment, a treatment solution is provided. The treatment solution is used for treating halosilanes having a cyclic structure. The treatment solution includes at least one of an inorganic base or an organic base and being basic.
Claims11
A method for treating halosilanes having a cyclic structure, the method comprising making the halosilanes having the cyclic structure come into contact with the treatment solution comprising at least one of an inorganic base or an organic base and being basic.
A method for treating halosilanes having a cyclic structure, the method comprising:
- making the halosilanes with the cyclic structure come into contact with water to obtain a mixture;
- and
- making the mixture come into contact with the treatment solution comprising at least one of an inorganic base or an organic base and being basic.
A method for treating a byproduct stemming from a process of synthesizing a silicon-containing material using a gas which comprises silicon and halogen, the byproduct comprising halosilanes having a cyclic structure, the method comprising:
- making the byproduct come into contact with a basic treatment solution under inert atmosphere.
Dependencies are inferred from the claim text.